Fabrication of digital rainbow holograms and 3-D imaging using SEM based e-beam lithography.

نویسندگان

  • An Firsov
  • A Firsov
  • B Loechel
  • A Erko
  • A Svintsov
  • S Zaitsev
چکیده

Here we present an approach for creating full-color digital rainbow holograms based on mixing three basic colors. Much like in a color TV with three luminescent points per single screen pixel, each color pixel of initial image is presented by three (R, G, B) distinct diffractive gratings in a hologram structure. Change of either duty cycle or area of the gratings are used to provide proper R, G, B intensities. Special algorithms allow one to design rather complicated 3D images (that might even be replacing each other with hologram rotation). The software developed ("RainBow") provides stability of colorization of rotated image by means of equalizing of angular blur from gratings responsible for R, G, B basic colors. The approach based on R, G, B color synthesis allows one to fabricate gray-tone rainbow hologram containing white color what is hardly possible in traditional dot-matrix technology. Budgetary electron beam lithography based on SEM column was used to fabricate practical examples of digital rainbow hologram. The results of fabrication of large rainbow holograms from design to imprinting are presented. Advantages of the EBL in comparison to traditional optical (dot-matrix) technology is considered.

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

ثبت نام

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

منابع مشابه

Ice lithography for nanodevices.

We report the successful application of a new approach, ice lithography (IL), to fabricate nanoscale devices. The entire IL process takes place inside a modified scanning electron microscope (SEM), where a vapor-deposited film of water ice serves as a resist for e-beam lithography, greatly simplifying and streamlining device fabrication. We show that labile nanostructures such as carbon nanotub...

متن کامل

Flexible Nanofabrication Equipment: E-beam Lithography System Based on SEM

Electron beam lithography (EBL) is widely used in nanoscale device fabrication and research due to high resolution and excellent flexibility. In this paper, nanometer EBL system based on scanning electron microscope (SEM) is introduced. Its main components include a modified SEM, a laser interferometer controlled stage, a versatile high speed pattern generator, and a fully functional and easyop...

متن کامل

An ice lithography instrument.

We describe the design of an instrument that can fully implement a new nanopatterning method called ice lithography, where ice is used as the resist. Water vapor is introduced into a scanning electron microscope (SEM) vacuum chamber above a sample cooled down to 110 K. The vapor condenses, covering the sample with an amorphous layer of ice. To form a lift-off mask, ice is removed by the SEM ele...

متن کامل

Microlithographic Pattern Generation for Optics

For the fabrication of optical and microoptical elements like gratings, lenses, waveguides, zoneplates, computer-generated holograms and so on, a lot of different fabrication technologies are available. Some of these elements are planar elements; i.e., the optical function of such elements is realized by a thin planar layer containing special structures and/or materials. For the fabrication of ...

متن کامل

Three-dimensional imaging of 30-nm nanospheres using immersion interferometric lithography

Immersion interferometric lithography has been applied successfully to semiconductor device applications, but its potential is not limited to this application only. This paper explores this imaging technology for the production of threedimensional nano-structures using a 193 nm excimer laser and immersion Talbot interferometric lithographic tool. The fabrication of 3-D photonic crystals for the...

متن کامل

ذخیره در منابع من


  با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

ثبت نام

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

عنوان ژورنال:
  • Optics express

دوره 22 23  شماره 

صفحات  -

تاریخ انتشار 2014